Spectral Instrument System

Semiconductor Wafers

  • Silicon (Si) Wafers, Sapphire Wafer, Germanium (Ge) Wafers
  • Gallium Arsenide (GaAs) Wafers, Gallium Antimonide (GaSb) Wafers
  • Indium Arsenide (InAs) Wafers, Thermal Oxide Wafers
  • Silicon-On-Insulator (SOI) Wafers, Silicon Carbide (SiC) Wafers
  • Zinc Oxide (ZnO) Wafers, Magnesium Oxide (MgO) Wafers
  • Strontium Titanate Oxide (SrTiO3) Wafers, Single Crystal Wafers
  • Quartz Wafers, Glass Wafers, Ceramic Wafers

 

Metal Single Crystals

  • Aluminium (Al), Antimony (Sb), Bismut (Bi), Cadmium (Cd)
  • Chromium (Cr), Cobalt (Co), Copper (Cu), Dysprosium (Dy)
  • Gadolinium (Gd), Germanium (Ge), Gold (Au), Hafnium (Hf)
  • Holmium ( Ho), Indium (In), Iridium (Ir), Iron (Fe), Lead (Pb)
  • Lithium (Li), Magnesium (Mg), Molybdenum (Mo), Nickel (Ni)
  • Niobium (Nb), Palladium (Pd), Platinum (Pt), Rhenium (Re)
  • Rhodium (Rh), Ruthenium (Ru), Silicon (Si), Silver(Ag), Tantalum (Ta)
  • Tellurium (Te), Tin (Sn), Titanium (Ti), Tungsten (W), Vanadium (V)
  • Yttrium (Y),  Zinc (Zn), Zirconium (Zr)

 

Substrates Single Crystals

  • For Superconductivity: Al2O3, LaAlO3, MgO, NdGaO3, SrLaGaO4, SrTiO3, Nb:SrTiO3, YAlO3, ZrO2(Y), etc.
  • Bicrystals: AlO3, MgO, SrTiO3, Nb:SrTiO3, ZrO2(Y), etc.
  • For III-V nitrides: Al2O3, LiAlO2, LiGaO2, MgAl2O4, MgO, NiAl, SiC, ZnO, etc.
  • Epi-ready polishing of surfaces with an orientation accuracy of <0.5° (standard) and better

 

Oxide Single Crystals

  • BaTiO, CoO, Cr2O3, FeO, Fe2O3, Gd3Ga5O12, MnO, NiO, SiO2, etc.
  • Polishing of surfaces with an orientation accuracy from 2° to <0.1deg.

 

Metal & Alloy Sputter Targets - Purity: 99%, 99.9%, 99.99%, 99.999%

  • Shape: Ingot, Plate, Foil, Sheet, Disc, Ring, Rod, Wire, Tube, Granule, Pellet, Shots etc.
  • Aluminum (Al) Target, Antimony (Sb) Target, Silver (Ag) Target
  • Gold (Au) Target, Cerium (Ce) Target, Cobalt (Co) Target
  • Carbon (C) Target, Chromium (Cr) Target, Copper (Cu) Target
  • Cadmium (Cd) Target, Dysprosium (Dy) Target, Erbium(Er) Target
  • Gadolinium (Gd) Target, Germanium (Ge) Target, Holmium (Ho) Target
  • Hafnium (Hf) Target, Indium (In) Target, Iridium (Ir) Target
  • Iron (Fe) Target, Lanthanum (La) Target, Lutetium (Lu) Target
  • Lead (Pb) Target, Magnesium (Mg) Target, Molybdenum (Mo) Target
  • Niobium (Nb) Target, Neodymium (Nd) Target, Nickel (Ni) Target
  • Praseodymium (Pr) Target, Platinum (Pt) Target, Rhenium (Re) Target
  • Ruthenium (Ru) Target, Scandium (Sc) Target, Silicon (Si) Target
  • Samarium(Sm) Target, Tantalum (Ta) Target, Terbium (Tb) Target
  • Titanium (Ti) Target, Thulium(Tm) Target, Tin (Sn) Target
  • Vanadium (V) Target, Tungsten (W) Target, Ytterbium (Yb) Target
  • Yttrium (Y) Target, Zirconium (Zr) Target, Zinc (Zn) Target

 

Ceramic Sputter Targets - Purity: 99.9% to 99.99%

  • Boride Ceramic Sputter Targets: Cr2B, CrB, CrB2, Cr5B3, FeB, HfB2, LaB6, Mo2B, Mo2B5, NbB, NbB2, TaB, TaB2, TiB2, W2B, WB, VB, VB2, ZrB2
  • Carbide Ceramic Sputter Targets: B4C, Cr3C2, HfC, Mo2C, NbC, SiC, TaC, TiC, WC, W2C, VC, ZrC
  • Fluoride Ceramic Sputter Targets : AlF3, BaF3, CdF2, CaF2, CeF3, DyF3, ErF3, HfF4, KF, LaF3, PbF2, LiF, PrF3, MgF2, NdF3, ReF3, SmF3, NaF, Cryolite, Na3AlF6 , SrF2, ThF4, YF3, YbF3
  • Nitrides Ceramic Sputter Targets: AlN, BN, GaN, HfN, NbN, Si3N4, TaN, TiN, VN, ZrN
  • Oxide Ceramic Sputter Ttargets: Al2O3, Sb2O3, ATO ,BaTiO3, Bi2O3, CeO2, ZnO,WO3,Nb2O5,,Cu2O,ITO,CuO, Cr2O3 ,Dy2O3 ,Er2O3, Eu2O3, Gd2O3, Ga2O3, GeO2, HfO2, Ho2O3, In2O3, ITO, Fe2O3, Fe3O4, La2O3, PbTiO3, PbZrO3, LiNbO3, Lu3Fe5O12, Lu2O3, MgO, MoO3, Nd2O3, Pr6O11, Pr(TiO2)2, Pr2O3, Sm2O3, Sc2O3, SiO2, SiO, SrTiO3, SrZrO3, Ta2O5, Tb4O7, TeO2, ThO2, Tm2O3, TiO2, TiO, Ti3O5, Ti2O3, SnO2, SnO, WO3, V2O5, YAG, Y3Al5O12, Yb2O3, Y2O3, ZnO, ZnO:Al, ZrO2(unstabilized), ZrO2-5-15wt%CaO)
  • Selenides Ceramic Sputter Targets: Bi2Se3, CdSe, CuSe, Ga2Se3, In2Se3, PbSe, MoSe2, NbSe2, TaSe2, WSe2, ZnSe
  • Silicides Ceramic Sputter Targets: Cr3Si, CrSi2, CoSi2, HfSi2, MoSi2, NbSi2, TaSi2, Ta5Si3, TiSi2, Ti5Si3, WSi2, V3Si, VSi2, ZrSi2
  • Sulfides Ceramic Sputter Targets: AgS, Ag2S, CuS, Cu2S, Sb2S3, As2S3, CdS, FeS, GaS, GeS, PbS, SnS, In2S3, MoS2, NbS1.75, TaS2, WS2, ZnS
  • Tellurides Ceramic Sputter Targets: Al2Te3,Bi2Te3, CdTe, CuTe, Ga2Te3, GeTe, PbTe, MoTe2, NbTe2, TaTe2, TmTe, WTe2, ZnTe
  • Others: AZO, Cr-SiO, CIGS, ITO, TiZrO3, PbZrTiO3, LaSrMnO3, SrRuO3, IGZO, GaAs, Ga-P, GaSb, In-Sb, InAs, InP, InSn, LSMO, Na3AlF6 , YBCO, LCMO, YSZ

 

Evaporating Materials - Purity: 99.9% to 99.999% (Fluorescence grade & Nanometer grade)

  • Shape: Powder, Disc, Wafer, Granule, Shot
  • Al pellet, Ag pellet, Chrome Plated Tungsten Rods, Cr pellet, Cu pellet, Hf pellet, Mo pellet, Ni Cr pellet, Ni pellet, W pellet, Ta pellet, W boat, Ir pellet, Zr pellet e.t.c (other shape: rods, shots, wire)
  • Rare Earth Oxide: Lanthanum oxide(La2O3), Cerium oxide(CeO2), Praseodymium oxide(Pr6O11),  Neodymium oxide(Nd2O3), Samarium oxide(Sm2O3), Europium oxide(Eu2O3), Gadolinium oxide(Gd2O3), Terbium oxide(Tb4O7), Dysprosium oxide(Dy2O3), Holmium oxide(Ho2O3), Erbium oxide(Er2O3), Thulium oxide(Tm2O3), Ytterbium oxide(Yb2O3), Lutetium oxide(Lu2O3), Scandium oxide(Sc2O3), Yttrium oxide(Y2O3)